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REPORT FROM THE FIRST OVM WORLD SUMMIT AT DAC
The recent Design Automation Conference (DAC) in Anaheim was the site for the first OVM World Summit, a meeting for OVM users to share their experiences and to interact among themselves and with representatives from Mentor and Cadence. The event was held on Thursday, June 12, 2008 and drew more than 70 attendees from a wide range of companies.
After a continental breakfast and introductions, hands-on OVM users from STMicro, Denali, and Willamette HDL talked about their experiences. Their comments clearly established that the OVM has the maturity and range of features to satisfy the most demanding verification projects. The users also offered some suggestions for future enhancements to the OVM.
This was followed by a panel with representatives from Doulos, Verilab, Denali, STMicro, Cadence and Mentor. Well-known EDA journalist Gabe Moretti moderated, grilling the panelists about several aspects of the methodology. The excellent questions from the floor ranged from requests for technical clarifications to queries about the role of the OVM in industry.
In the final session, OVM technologists Mark Glasser from Mentor and Sharon Rosenberg from Cadence discussed content in the next major release (2.0) and some ideas for how the OVM may evolve beyond that. They strongly encouraged user involvement in the OVM and its future, by participation in the OVM Forum and by providing feedback to vendors who support the methodology.
The comments from most attendees were very positive; many users lingered after the event to talk with each other and the OVM technologists. Cadence and Mentor will be looking for opportunities to host similar events at other tradeshows in the future. Any feedback from the DAC event or suggestions for other venues can be submitted via the OVM Forum.
OVM Summit Panel
OVM Summit Audience
Photos of the OVM World Summit, courtesy of Tom Fitzpatrick.
